Experimental and theoretical characterization of Cu adsorption sites on the Si(111)-7x7 surface

被引:2
作者
Mutombo, P [1 ]
Shukrinov, P [1 ]
Cháb, V [1 ]
机构
[1] ASCR, Inst Phys, CZ-16253 Prague, Czech Republic
关键词
density functional calculations; STM; silicon; copper; adsorption; surface chemical reaction;
D O I
10.1016/j.susc.2005.03.036
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Scanning tunneling microscopy (STM) experiments were used to study Cu adsorption on Si(111)-7 x 7. The experimental results suggest that Cu atoms appear as dark spots while Si adatoms adjacent to them are imaged as gray or bright protrusions in the filled states images. We observed a mutual contrast reversal in the empty states between these bright and gray spots. Based on these experimental findings, we propose that Cu is located below the Si adatom layer. In order to verify this hypothesis, we performed total energy calculations and simulated STM maps by means of Density Functional Calculations. We tested different chemisorption geometries of Cu on the Si surface: on top of a rest atom and a corner adatom, at the so-called T-4 and H-3 sites as well as at positions situated halfway between the above adsorption positions. The theoretical results lead to the conclusion that Cu is located between the T4 and H3 adsorption sites. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:173 / 178
页数:6
相关论文
共 16 条
  • [1] Characterization of Cu-reacted sites for Cu/Si(111)-(7 x 7)
    Atwell, AR
    Zuo, JK
    [J]. SURFACE SCIENCE, 1998, 417 (2-3) : 261 - 267
  • [2] THEORY OF ADSORPTION OF ATOMS AND MOLECULES ON SI(111)-(7X7)
    BROMMER, KD
    GALVAN, M
    DALPINO, A
    JOANNOPOULOS, JD
    [J]. SURFACE SCIENCE, 1994, 314 (01) : 57 - 70
  • [3] MODELING LARGE SURFACE RECONSTRUCTIONS ON THE CONNECTION MACHINE
    BROMMER, KD
    LARSON, BE
    NEEDELS, M
    JOANNOPOULOS, JD
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (3B): : 1360 - 1367
  • [4] CHARACTERIZATION OF INTERMIXING AT METAL-SEMICONDUCTOR INTERFACES BY ANGLE-RESOLVED AUGER-ELECTRON EMISSION - CU/SI(111)-7X7
    CHAMBERS, SA
    HOWELL, GA
    GREENLEE, TR
    WEAVER, JH
    [J]. PHYSICAL REVIEW B, 1985, 31 (10): : 6402 - 6410
  • [5] METAL SI BONDING IN CU/SI(111) 5X5 USING ANGLE-RESOLVED ULTRAVIOLET PHOTOEMISSION SPECTROSCOPY AND BAND-STRUCTURE CALCULATIONS
    CHAMBLISS, DD
    RHODIN, TN
    KASOWSKI, RV
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1499 - 1502
  • [6] Diffusion of adsorbate atoms on the reconstructed Si(111) surface
    Cho, KJ
    Kaxiras, E
    [J]. SURFACE SCIENCE, 1998, 396 (1-3) : L261 - L266
  • [7] Wide range temperature dependence of reflection high-energy electron diffraction rocking curve from a Si(111)7x7 surface
    Fukaya, Y
    Nakamura, K
    Shigeta, Y
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (03): : 968 - 971
  • [8] ELECTRONIC AND GEOMETRIC STRUCTURE OF SI(111)-(7X7) AND SI(001) SURFACES
    HAMERS, RJ
    TROMP, RM
    DEMUTH, JE
    [J]. SURFACE SCIENCE, 1987, 181 (1-2) : 346 - 355
  • [9] ISS AES STUDY OF THE INITIAL GROWTH STAGE OF CU THIN-FILMS ON SI(111)-7X7
    KATAYAMA, I
    HANAWA, T
    SHOJI, F
    OURA, K
    [J]. APPLIED SURFACE SCIENCE, 1991, 48-9 : 361 - 365
  • [10] ABSOLUTE ELECTRONEGATIVITY AND HARDNESS - APPLICATION TO INORGANIC-CHEMISTRY
    PEARSON, RG
    [J]. INORGANIC CHEMISTRY, 1988, 27 (04) : 734 - 740