X-ray photoelectron spectroscopy

被引：0

作者：

Benoît, R ^{[1
]}

机构：

[1] Univ Orleans, CNRS, CRMD, F-45071 Orleans 2, France

来源：

VIDE-SCIENCE TECHNIQUE ET APPLICATIONS | 2003年 / 58卷 / 308期

关键词：

XPS; ESCA; photoelectron; chemical analysis; surface characterization; depth profile; chemical mapping;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

X-ray photoelectron spectroscopy (XPS or ESCA), is an analytical technique for chemical surface studies. Used in research, development and manufacturing, this technique is able to obtain the chemical composition of various material surfaces up to 10 nm depth. It is possible to find out if this material is superficially oxidised, or for instance if it contains iron, or carbon. Most of the elements can be detected except hydrogen. Qualitative and quantitative analysis can be performed with a relative precision of 5 % using elemental sensitivity factors. With a detection limit of about 0, 1 % atomic concentration, XPS is a no destructive technique. XPS can also be combined with Argon sputtering to obtain concentration profiles and information on internal interfaces and layers.

引用

页码：219 / +

页数：12