Absorptance measurements for the DUV spectral range by laser calorimetry

被引:0
作者
Blaschke, H [1 ]
Jupé, M [1 ]
Ristau, D [1 ]
机构
[1] Laser Zentrum Hannover EV, D-30419 Hannover, Germany
来源
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2002 AND 7TH INTERNATIONAL WORKSHOP ON LASER BEAM AND OPTICS CHARACTERIZATION | 2003年 / 4932卷
关键词
laser calorimetry; absorptance; loss mechanisms; DUV; ISO; 11551;
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The determination of absorptance in optical components is of crucial interest in respect to their power-handling capability. As a fundamental loss mechanism in the DUV/VUV spectral range, the absorptance is a significant parameter to decide the applicability of an optic in the industrial facilities. The established measuring technique of laser-calorimetry in accordance to the standard ISO 11551 was adapted to the wavelength of the ArF-laser (lambda = 193 nm) [1]. The present paper describes the developed set-up considering the problems of calibration in the DUV spectral range. In detail, the electrical and optical calibration method were performed and different effects are discussed with regard to the practicability of both procedures. Furthermore, the reduction of scattered light in combination with a remarkable increase in sensitivity is demonstrated. As typical substrate materials for optical components at this laser wavelength, fused silica and CaF2 were investigated determining the absorptance. Simultaneously, the characteristic luminescence spectrum has been recorded during the investigations.
引用
收藏
页码:467 / 474
页数:8
相关论文
共 5 条
[1]  
BLASCHKE H, 2002, SPIE P, V4679
[2]  
GEORGE RA, 1996, SEMICONDUCTOR FABTEC
[3]  
HENKING R, 1994, SPIE P, V2428
[4]  
*ISO, 2000, 11551 ISO
[5]   Luminescence and damage thresholds of cerium-doped LaF3 for ns-pulsed laser excitation at 248 nm [J].
Lindner, R ;
Reichling, M ;
Matthias, E ;
Johansen, H .
APPLIED PHYSICS B-LASERS AND OPTICS, 1999, 68 (02) :233-241