Preparation and Spectroscopy Investigation of Vanadium Oxide Films Deposited by DC Magnetron Sputtering

被引:0
|
作者
Li Li-sha [2 ]
Cui Hai-ning [1 ]
Jiang Zhen-yi [3 ]
机构
[1] Jilin Univ, Coll Phys, Changchun 130012, Peoples R China
[2] NW Univ Xian, Dept Phys, Xian 710069, Peoples R China
[3] NW Univ Xian, Inst Modern Phys, Xian 710069, Peoples R China
关键词
Vanadium oxide films; DC magnetron sputtering; Ultraviolet-visible (UV-Vis) spectrum; Infrared spectrum (FTIR); Laser Raman spectrum; THIN-FILMS; ELECTROCHEMICAL PROPERTIES; SUBSTRATE-TEMPERATURE; PENTOXIDE;
D O I
10.3964/j.issn.1000-0593(2011)01-0095-05
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Vanadium oxide films were deposited at different substrate temperatures up to 400 degrees C by DC magnetron sputtering, and through the method of the X-ray diffraction, electron scanning microscopy, infrared and Raman spectra, the present paper studies the structure properties of those films, and through the method of spectrum measuring and fitting, this paper studies the optical properties of the films. At low temperature of preparation the optical films have high optical transmittance. The films prepared at low substrate temperature (lower than 200 degrees C) have amorphous structure and some films prepared at high substrate temperatures (higher than 200 degrees C) have polycrystalline structure. The films' optical parameters were achieved by using classic model to fit the characteristic of transmittance.
引用
收藏
页码:95 / 99
页数:5
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