Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study

被引：9

作者：

Nemsak, Slavomir ^{[1
]}

Skala, Tomas ^{[2
]}

Yoshitake, Michiko ^{[1
]}

Tsud, Nataliya ^{[3
]}

Kim, Taeyoung ^{[1
]}

Yagyu, Shinjiro ^{[1
]}

Matolin, Vladimir ^{[3
]}

机构：

[1] Natl Inst Mat Sci, Adv Elect Mat Ctr, Tsukuba, Ibaraki 3050003, Japan

[2] Sincrotrone Trieste SCpA, I-34149 Basovizza Trieste, Italy

[3] Charles Univ Prague, Fac Math & Phys, CR-18000 Prague, Czech Republic

来源：

SURFACE AND INTERFACE ANALYSIS | 2010年 / 42卷 / 10-11期

关键词：

XPS; LEED; Ni; alumina; aluminum oxide; thin layer; OXIDE OVERLAYER; WORK FUNCTION; NI3AL ALLOY; OXIDATION; AL2O3; ADSORPTION; THICKNESS; SURFACE;

D O I：

10.1002/sia.3582

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An epitaxial ultra-thin alumina layer was prepared on Ni(111) by simultaneous Al deposition and oxidation at elevated temperatures. Different deposition procedures lead to creation of oxide layers of various thicknesses and quality. Low-energy electron diffraction revealed epitaxial parameters of the films and the relationship between the nickel substrate and the oxide overlayer. Core-level photoelectron spectroscopy using Al-K-alpha and synchrotron-generated photons show that the oxide-metal interface is formed by oxygen atoms, which is contrary to the case of epitaxial alumina layers prepared by the oxidation of NiAl(110) and Ni3Al(111) surfaces. The results of a photoelectric work function measurement are also discussed. Copyright (C) 2010 John Wiley & Sons, Ltd.

引用

页码：1581 / 1584

页数：4

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