MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

被引：57

作者：

Moniz, Savio J. A. ^{[1
]}

Blackman, Christopher S. ^{[1
]}

Carmalt, Claire J. ^{[1
]}

Hyett, Geoffrey ^{[1
]}

机构：

[1] UCL, Dept Chem, Mat Chem Ctr, London WC1H 0AJ, England

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2010年 / 20卷 / 36期

基金：

英国工程与自然科学研究理事会;

关键词：

CHEMICAL-VAPOR-DEPOSITION; INDUCED HYDROGEN-PRODUCTION; TRANSPORT-PROPERTIES; MOLECULAR-STRUCTURE; RAMAN-SPECTROSCOPY; OPTICAL-PROPERTIES; OXIDE-FILMS; SILLENITES; GROWTH; PT/BI2O3/RUO2;

D O I：

10.1039/c0jm01720e

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Bismuth(III) tert-butoxide [Bi((OBu)-Bu-t)(3)] was utilised as a single-source precursor to controllably deposit thin films of different phases of bismuth oxide (Bi2O3) on glass substrates via low-pressure chemical vapour deposition (LPCVD). Band gaps for the different phases have been measured (E-g = 2.3-3.0 eV) and the films displayed excellent photodegradation of water under near-UV irradiation.

引用

页码：7881 / 7886

页数：6

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