Growth mechanism of YBCO film by TFA-MOD process

被引：12

作者：

Teranishi, R

Honjo, T

Nakamura, Y

Fuji, H

Tokunaga, Y

Matsuda, J

Izumi, T

Shiohara, Y

机构：

[1] ISTEC, Superconduct Res Lab, Koto Ku, Tokyo 1350062, Japan

[2] Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan

来源：

PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2003年 / 392卷

关键词：

TFA-MOD process; growth rate; YBCO;

D O I：

10.1016/S0921-4534(03)01197-3

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The growth rate expression in the TFA-MOD process for fabrication of coated conductors was revised according to the measurement of the growth rate using a long tape. The P(H2O) distribution along the gas flow-direction was calculated by the advection diffusion model. The above two outputs were combined to predict the minimum annealing time for complete reaction in the sample tape with a finite width. The prediction from the model was in good agreement with the experimental results. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：882 / 886

页数：5