Growth mechanism of YBCO film by TFA-MOD process

被引：12
作者：
Teranishi, R
Honjo, T
Nakamura, Y
Fuji, H
Tokunaga, Y
Matsuda, J
Izumi, T
Shiohara, Y
机构：
[1] ISTEC, Superconduct Res Lab, Koto Ku, Tokyo 1350062, Japan
[2] Toyohashi Univ Technol, Toyohashi, Aichi 4418580, Japan
来源：
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2003年 / 392卷
关键词：
TFA-MOD process; growth rate; YBCO;
D O I：
10.1016/S0921-4534(03)01197-3
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The growth rate expression in the TFA-MOD process for fabrication of coated conductors was revised according to the measurement of the growth rate using a long tape. The P(H2O) distribution along the gas flow-direction was calculated by the advection diffusion model. The above two outputs were combined to predict the minimum annealing time for complete reaction in the sample tape with a finite width. The prediction from the model was in good agreement with the experimental results. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：882 / 886
页数：5
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