Microstructure of phosphorus ion-implanted TiNi alloy

被引：0
作者：
Zhao, XK [1 ]
Gao, ZY
Cai, W
Zhao, LC
机构：
[1] Harbin Inst Technol, Harbin 150001, Peoples R China
[2] Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
来源：
JOURNAL OF MATERIALS SCIENCE | 2005年 / 40卷 / 19期
关键词：
D O I：
10.1007/s10853-005-4352-y
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The microstructures of phosphorus ion-implanted TiNi alloys were investigated. Specimens were cut from cold-rolled plates. These microstructures were studied with transmission electron microscopy (TEM) and high-resolution electron microscopy (HREM) techniques. Phase constitution was studied using small gazing incidence angle X-ray diffraction (GAXRD) method. Martensite and amorphous phases were formed in succession as phosphorus ion implanting does increasing from 1017 to 1018 P/cm2. The results show that annealing at a temperature above 773 K can mitigate the PII treatment effect and recover the microstructure.
引用
收藏
页码：5291 / 5293
页数：3
相关论文
共 50 条
[1]   Microstructure of phosphorus ion-implanted TiNi alloy [J].
Zhao Xingke ;
Gao Zhiyong ;
Cai Wei ;
Zhao Liancheng .
Journal of Materials Science, 2005, 40 :5291-5293
[2]   Microstructure of ion-implanted region in TiNi alloy [J].
Ikenaga, Noriaki ;
Kishi, Yoichi ;
Yajima, Zenjiro ;
Sakudo, Noriyuki ;
Nakano, Shizuka ;
Ogiso, Hisato .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2009, 267 (8-9) :1509-1513
[3]   Microstructure and hemocompatibility of a phosphorus ion-implanted TiNi shape-memory alloy [J].
Zhao, XK ;
Cai, W ;
Tian, Y ;
Zhao, LC .
SHAPE MEMORY MATERIALS AND ITS APPLICATIONS, 2001, 394-3 :153-156
[4]   Surface morphology and plastic deformation of the ion-implanted TiNi alloy [J].
Meisner, LL ;
Sivokha, VP ;
Lotkov, AI ;
Derevyagina, LA .
PHYSICA B-CONDENSED MATTER, 2001, 307 (1-4) :251-257
[5]   Micro-analysis of N+ ion-implanted TiNi shape memory alloy [J].
Feng, Xiangdong ;
Wang, Zhiguo ;
Zu, Xiaotao ;
Dai, Jinyi .
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2003, 32 (04) :309-312
[6]   Micro-analysis of N+ ion-implanted TiNi shape memory alloy [J].
Feng, XD ;
Wang, ZG ;
Zu, XT ;
Dai, JY .
RARE METAL MATERIALS AND ENGINEERING, 2003, 32 (04) :309-312
[7]   DIFFUSION OF ION-IMPLANTED PHOSPHORUS IN SILICON [J].
CHELYADINSKII, AR ;
TAHER, HIH .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1994, 142 (02) :331-338
[8]   Study of corrosion behavior and haemocompatibility of ion-implanted TiNi shape memory alloy and cobalt alloys [J].
Guo, Hai-Xia ;
Liang, Cheng-Hao ;
Mu, Zong-Xin .
Dalian Ligong Daxue Xuebao/Journal of Dalian University of Technology, 2002, 42 (03) :301-305
[9]   CHANNELING AND DECHANNELING OF ION-IMPLANTED PHOSPHORUS IN SILICON [J].
REDDI, VGK ;
SANSBURY, JD .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (07) :2951-2963
[10]   ASYMMETRICAL PROFILES OF ION-IMPLANTED PHOSPHORUS IN SILICON [J].
INOUE, K ;
HIRAO, T ;
YAEGASHI, Y ;
TAKAYANAGI, S .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (02) :367-372
12345