Origin of the interface dipole at interfaces between undoped organic semiconductors and metals

被引:74
|
作者
Knupfer, M [1 ]
Paasch, G [1 ]
机构
[1] Leibniz Inst Festkorper & Werkstofforsch Dresden, D-01171 Dresden, Germany
来源
关键词
D O I
10.1116/1.1885021
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Interfaces between metals and intrinsic organic semiconductors are often characterized by the presence of a relatively large interface dipole confined to a narrow interfacial layer. Different potential contributions to this interface dipole are discussed. (c) 2005 American Vacuum Society.
引用
收藏
页码:1072 / 1077
页数:6
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