Preparation of transparent thick films by electrophoretic sol-gel deposition using phenyltriethoxysilane-derived particles

被引:0
作者
Katagiri, K [1 ]
Hasegawa, K [1 ]
Matsuda, A [1 ]
Tatsumisago, M [1 ]
Minami, T [1 ]
机构
[1] Univ Osaka Prefecture, Coll Engn, Dept Appl Mat Sci, Osaka 5998531, Japan
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中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thick films were prepared on glass substrates coated with indium tin oxide (ITO) via electrophoretic deposition using sols that contained phenylsilsesquioxane (PhSiO3/2) particles derived from phenyltriethoxysilane. The transparency of the thick PhSiO3/2 films was significantly improved via heat treatment at temperatures >200 degrees C. Scanning electron microscopy observation showed that the thick films changed in morphology, from aggregates of particles with several open spaces among the particles to a monolith with no open spaces after the heat treatment. Transparent films similar to 3 mu m thick were obtained when the films were heat-treated at a temperature of 400 degrees C for 2 h.
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页码:2501 / 2503
页数:3
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