The study of the local atomic structure by means of X-ray photoelectron diffraction

被引:79
作者
Westphal, C [1 ]
机构
[1] Univ Dortmund, D-44221 Dortmund, Germany
关键词
buried interfaces; photoelectron diffraction; electron spectroscopy; photoemission; surfaces;
D O I
10.1016/S0167-5729(03)00022-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Photoelectron diffraction is under rapid development to a powerful method for the investigation of structures at surfaces. Within the escape length of photoelectrons an element-specific signal can be chosen from the photoelectron spectrum in order to separately investigate the local structure around a certain element, or in high-resolution mode, the local structure around a specific chemical state. A brief overview of the theoretical and numerical aspects on calculating X-ray photoelectron diffraction intensities is given. The experimental two branches of recording photoelectron diffraction patterns as a function of angle or energy are discussed. Presently, these branches merge due to the availability of tunable high-flux X-ray radiation from third generation synchrotron sources. Examples for structures at surfaces and buried interfaces are discussed. Spin-dependent scattering and diffraction processes within the surface layer may lead to spin-depending intensities observed at the detector. This opens a possible way to investigate magnetic buried structures. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1 / 106
页数:106
相关论文
共 268 条
  • [91] Structural studies of SO2 adsorption on metal surfaces
    Haase, J
    [J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 1997, 9 (18) : 3647 - 3670
  • [92] HAASE J, 1992, ADV SURFACE INTERFAC, V2
  • [93] SCANNED-ANGLE X-RAY PHOTOEMISSION HOLOGRAPHY WITH ATOMIC RESOLUTION
    HARP, GR
    SALDIN, DK
    TONNER, BP
    [J]. PHYSICAL REVIEW B, 1990, 42 (14): : 9199 - 9202
  • [94] Chemical structures of the SiO2/Si interface
    Hattori, T
    [J]. CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1995, 20 (04) : 339 - 382
  • [95] Surface, interface and valence band structures of ultra-thin silicon oxides
    Hattori, T
    [J]. APPLIED SURFACE SCIENCE, 1998, 130 : 156 - 164
  • [96] Elastic scattering of Si 2p photoelectrons in silicon oxide
    Hattori, T
    Hirose, K
    Nohira, H
    Takahashi, K
    Yagi, T
    [J]. APPLIED SURFACE SCIENCE, 1999, 144-45 : 297 - 300
  • [97] Growth of Ag on Cu(001) studied by full-hemispherical X-ray photoelectron diffraction
    Hayoz, J
    Naumovic, D
    Fasel, R
    Aebi, P
    Schlapbach, L
    [J]. SURFACE SCIENCE, 1997, 373 (2-3) : 153 - 172
  • [98] Surface crystallography by low energy electron diffraction
    Heinz, K
    Hammer, L
    [J]. ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 1998, 213 (12): : 615 - 634
  • [99] Holographic low-energy electron diffraction
    Heinz, K
    Seubert, A
    Saldin, DK
    [J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 2001, 13 (47) : 10647 - 10663
  • [100] DIFFUSE LEED AND SURFACE CRYSTALLOGRAPHY
    HEINZ, K
    SALDIN, DK
    PENDRY, JB
    [J]. PHYSICAL REVIEW LETTERS, 1985, 55 (21) : 2312 - 2315