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Thermal and stress studies of normal incidence Mo/B4C multilayers for a 6.7 nm wavelength
被引:39
作者:
Barthelmess, Miriam
[1
]
Bajt, Sasa
[1
]
机构:
[1] DESY, D-22607 Hamburg, Germany
关键词:
FREE-ELECTRON LASER;
X-RAY MIRRORS;
EXTREME-ULTRAVIOLET;
REFLECTIVE MULTILAYER;
MO/SI MULTILAYERS;
FILMS;
STABILITY;
OPTICS;
LITHOGRAPHY;
REDUCTION;
D O I:
10.1364/AO.50.001610
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
Wavelength, reflectance, and stress stability of Mo/B4C multilayers were studied as a function of post-deposition annealing up to 900 degrees C. These multilayers are of interest as normal incidence coatings for wavelengths above the boron K-absorption edge. Mo/B4C multilayers deposited at low sputtering pressure have high compressive stress. Zero stress can be achieved at 360 degrees C-370 degrees C, but annealing at < 200 degrees C is sufficient to reduce stress by similar to 40%. This stress relaxation is accompanied with a multilayer period expansion of similar to 0.02nm and a < 0.5% decrease in normal incidence reflectivity. The multilayer period remains stable up to similar to 600 degrees C, while intrinsic stress changes from compressive to tensile. A four-layer model with amorphous molybdenum and boron carbide layers separated by amorphous layers of molybdenum borides (MoxBy) is presented. These interlayers are present already in the as-deposited state and continue to grow with increasing temperature. Their presence lowers the optical contrast and the achievable reflectivity. However, they also increase multilayer thermal stability. At temperatures > 600 degrees C, a noticeable decrease in reflectivity associated with the phase transition from amorphous to crystalline molybdenum boride is observed. This is accompanied with an increase in interface and surface roughness and a change in stress as a function of temperature. (C) 2011 Optical Society of America
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页码:1610 / 1619
页数:10
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