Threshold measurement of two-photon laser induced photopolymerization via Z-scan

被引:0
|
作者
Boiko, Yuri [1 ]
机构
[1] YBBR Inc, Ottawa, ON K1K 3Y2, Canada
关键词
threshold; two-photon; photopolymerization; Z-scan; POLYMERIZATION; SYSTEM;
D O I
10.1117/12.843601
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A technique is suggested to measure a threshold of two-photon initiated photopolymerisation involving Z-scan of a thin film of sensitive material along the focusing axis of the laser beam. The condition of reaching the threshold when gradually increasing the light intensity by moving the film towards the focal spot of the beam is defined as that with minimal intensity at which polymerization occurs. The occurrence of the polymerization is detected by interferometric effect inside the transmitted beam itself, which is due to interference of the wave going through the polymerization area and the wave going around it. The technique is demonstrated for measurements employing Nd:YAG laser in nanosecond regime with fundamental frequency 1064 nm and its harmonic of 532 nm, as well as with pumped by its third harmonic optical parametric oscillator. Threshold data are presented for particular systems, indicating threshold of 5 GW/cm(2) for a system based on Rose Bengal exposed by 1064 nm nanosecond-pulsed radiation and 0.05 GW/cm(2) for Darocur initiators exposed to 532 nm.
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页数:4
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