Dual Gate Single-Electron Transistors with a Recessed Channel and Underlapped Source/Drain Structure

被引:0
作者
Lee, Joung-Eob [1 ,2 ]
Kim, Garam [1 ,2 ]
Yun, Jang-Gn [1 ,2 ]
Kang, Kwon-Chil [1 ,2 ]
Lee, Jung-Han [1 ,2 ]
Kim, Dae-Hwan [3 ]
Lee, Jong-Ho [1 ,2 ]
Shin, Hyungcheol [1 ,2 ]
Park, Byung-Gook [1 ,2 ]
机构
[1] Seoul Natl Univ, Inter Univ Semicond Res Ctr, Seoul 151742, South Korea
[2] Seoul Natl Univ, Sch Elect Engn, Seoul 151742, South Korea
[3] Kookmin Univ, Sch Elect Engn, Seoul 146702, South Korea
关键词
COULOMB-BLOCKADE OSCILLATIONS; TUNNELING BARRIER STRUCTURES; SILICON QUANTUM-DOT; ROOM-TEMPERATURE; SWITCH; LOGIC;
D O I
10.1143/JJAP.49.115201
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, we have fabricated and characterized the dual gate single electron transistors (DG SETs) This device has recessed channel and underlapped source/drain structure Fabrication flow and device structure are described as well as operation schemes Clear Coulomb oscillation peaks and negative differential trans conductance curve are observed at room temperature (300 K) Measurement results obtained at period of Coulomb oscillation is 0.9V due to an ultra small control gate capacitance and oscillation peaks are shifted through the sidewall gate bias Also in order to confirm that single electron tunneling is caused by the electrically induced tunneling barriers and not by random fluctuations along the silicon-on-insulator (SOI) active room temperature measurement results for device with different parameters compared (C) 2010 The Japan Society of Applied Physics
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页数:5
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