Volume and heterogeneous chemistry of active species in chlorine plasma

被引:14
作者
Efremov, AM
Kim, DP
Kim, CI
机构
[1] Chung Ang Univ, Sch Elect & Elect Engn, Dongjak Gu, Seoul 156756, South Korea
[2] Ivanovo State Univ Chem & Technol, Dept Microelect Devices & Mat Technol, Ivanovo, Russia
关键词
chlorine plasma; electron impact; rate coefficient; ionization; dissociation;
D O I
10.1016/S0040-6090(03)00378-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Chlorine plasma parameters and the mechanisms of both volume and heterogeneous reactions were investigated using a combination of experimental methods and plasma modeling. It was found that increasing gas pressure within the range 20-200 Pa leads to sufficient deformation of the electron energy, distribution function and to corresponding changes in kinetic and transport coefficients. Direct electron impact dissociation and ionization were found to be the main mechanisms for radical and ion generation, while contributions from dissociative attachment and dissociative ionization were negligible. Heterogeneous recombination of chlorine atoms is the dominant decay channel, which is described by a first-order kinetic mechanism. (C) 2003 Elsevier Science B.V. All tights reserved.
引用
收藏
页码:83 / 88
页数:6
相关论文
共 12 条
[1]   Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption [J].
Choe, JY ;
Herman, IP ;
Donnelly, VM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (06) :3024-3031
[2]  
CLYNE MAA, 1988, T FARADAY SOC, V64, P2968
[3]   REMOTE PLASMA-ETCHING REACTORS - MODELING AND EXPERIMENT [J].
DESHMUKH, SC ;
ECONOMOU, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (02) :206-215
[4]  
Efremov A., 2001, J SEMICOND SCI TECHN, V1, P197
[5]  
EFREMOV AM, 1995, HIGH ENERG CHEM+, V29, P433
[6]  
*EN, 1991, PHYS VAL, P263
[7]   Mass spectrometric determination of the percent dissociation of a high-density chlorine plasma [J].
Gaddy, GA ;
Webb, SF ;
Blumenthal, R .
APPLIED PHYSICS LETTERS, 1997, 71 (22) :3206-3208
[8]  
KUPRIYANOVSKAYA AP, 1990, COMPILATION ELEMENTA, P60
[9]   Diagnostics of inductively coupled chlorine plasmas:: Measurement of Cl2 and Cl number densities [J].
Malyshev, MV ;
Donnelly, VM .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (11) :6207-6215
[10]   Two-dimensional pulsed-plasma simulation of a chlorine discharge [J].
Ramamurthi, B ;
Economou, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002, 20 (02) :467-478