Improvement in the Optical and Electrical Properties of Ga-doped Zinc-oxide Films by Using Nano-imprinted Pattern Arrays and Post-annealing

被引:2
|
作者
Lee, Su Yeon [1 ]
Lee, Seong Eui [1 ]
Lee, Hee Chul [1 ]
Lee, Ho Nyun [2 ]
Kim, Hyun Jong [2 ]
机构
[1] Korea Polytech Univ, Dept Adv Mat Engn, Shihung 429793, South Korea
[2] Korea Inst Ind Technol, Incheon Reg Div, Surface Technol R&BD Grp, Inchon 406840, South Korea
关键词
GZO; TCO; UV nano-imprinting; Lift-off process; Post-annealing; NANOIMPRINT LITHOGRAPHY; FABRICATION; TEMPERATURE; NANOSTRUCTURES; TECHNOLOGY; ELECTRODE; LAYERS; MOLD; DC;
D O I
10.3938/jkps.66.246
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The effects of nano-imprinted arrays and post-annealing on the optical and the electrical properties of sputtered Ga-doped zinc-oxide (GZO) films were intensively investigated to develop suitable electrodes for photonic applications. We fabricated nano-structures with a GZO circular pattern with a diameter of 250 nm by using UV nano-imprinting lithography and the lift-off process. The nano-structured GZO/glass substrate showed a high optical transmittance of 91.0% at a wavelength of 550 nm, which was increased by about 2.2% compared to that of unprocessed GZO/glass. Then nano-structured GZO/glass substrate was rapidly annealed under different conditions to acquire a high optical transmittance and a low resistivity. The optimized nano-structured GZO film post-annealed at 400 degrees C showed the highest optical transmittance of 92.0% and an improved resistivity of 1.3 x 10(-3) Omega.cm.
引用
收藏
页码:246 / 251
页数:6
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