Development of gas cluster ion beam equipment

被引：0

作者：

Mack, ME ^{[1
]}

机构：

[1] Epion Corp, Billerica, MA USA

来源：

APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY | 2001年 / 576卷

关键词：

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The development of a fully mechanically scanned gas cluster ion beam tool is described. Average surface roughnesses of better than 10 Angstrom can be achieved with this equipment.

引用

页码：991 / 994

页数：4

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