Pellicle dimensions for high NA photomasks - art. no. 67303Y

被引：0
|
作者：
Erber, Frank [1 ]
Schulmeyer, Thomas [1 ]
Holfeld, Christian [1 ]
机构：
[1] Adv Mask Technol Ctr GmbH & Co KG, D-01109 Dresden, Germany
来源：
PHOTOMASK TECHNOLOGY 2007, PTS 1-3 | 2007年 / 6730卷
关键词：
pellicle; inspection; shadowing; pellicle height; pellicle size; high NA lithography; 193nm lithography;
D O I：
10.1117/12.746681
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
At photomask manufacturing, post pellicle inspection suffers from an interference of pellicle size and height dimensions with the inspection equipment requirements. This pellicle shadow causes non-reliable inspection results. The evolution of this effect as well as similar potentially upcoming effects during other lithography processes need to be understood in order to identify potential problems ahead of time and guide the industry accordingly. The study recommends standardizing pellicle size and height dimensions in order to coordinate the required changes at scanner, mask inspection, mask metrology and pellicle vendors in the near and long term. Since frequent changes in other pellicle properties are expected over time to fulfill the requirements for high NA lithography and haze reduction, a standard in pellicle dimensions will also help controlling the complexity of pellicle variations.
引用
收藏
页码：Y7303 / Y7303
页数：9
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