Gallium-arsenide deep-level pin tunnel diode with very negative conductance

被引:3
作者
Pan, JL [1 ]
McManis, JE [1 ]
Grober, L [1 ]
Woodall, JM [1 ]
机构
[1] Yale Univ, New Haven, CT 06520 USA
关键词
D O I
10.1049/el:20030895
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The first tunnel diodes utilising deep levels in low-temperature-grown gallium arsenide (GaAs) are demonstrated. At room temperature, the negative conductance per area of 1/1.2 kOmega mum(2) is the largest ever measured in GaAs tunnel diodes, which also show peak-to-valley current ratios as high as 19 and peaks of 1.6 kA/cm(2).
引用
收藏
页码:1411 / 1412
页数:2
相关论文
共 2 条
[1]   Use of nonstoichiometry to form GaAs tunnel junctions [J].
Ahmed, S ;
Melloch, MR ;
Harmon, ES ;
McInturff, DT ;
Woodall, JM .
APPLIED PHYSICS LETTERS, 1997, 71 (25) :3667-3669
[2]   Molecular beam epitaxy of nonstoichiometric semiconductors and multiphase material systems [J].
Melloch, MR ;
Nolte, DD ;
Woodall, JM ;
Chang, JCP ;
Janes, DB ;
Harmon, ES .
CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1996, 21 (03) :189-263