Influence of hydrogen etching on the adhesion of coated ferrous alloy by hydrogenated amorphous carbon deposited at low temperature

被引：9

作者：

Crespi, A. E. ^{[1
]}

Leidens, L. M. ^{[1
]}

Aguzzoli, C. ^{[1
]}

Alvarez, F. ^{[2
]}

Figueroa, C. A. ^{[1
,3
]}

机构：

[1] Univ Caxias Do Sul, PGMAT, BR-95070560 Caxias Do Sul, Brazil

[2] Univ Estadual Campinas, IFGW, DFA, BR-13083970 Campinas, SP, Brazil

[3] Plasmar Tecnol Ltda, BR-95030775 Caxias Do Sul, Brazil

来源：

VACUUM | 2017年 / 144卷

基金：

巴西圣保罗研究基金会;

关键词：

lnterlayer; Hydrogen effect; Adhesion; Amorphous carbon; PECVD; Electrostatic confinement; DIAMOND-LIKE CARBON; THIN-FILMS; PROMPTING ADHESION; STRESS; PLASMA; SILICON; METAL; INTERLAYER; OXYGEN;

D O I：

10.1016/j.vacuum.2017.07.038

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Carbonaceous thin films show poor adhesion when deposited on steels. Chromium, titanium, and silicon containing interlayers are generally used in order to prompt adhesion. This work shows a systematic study of the hydrogen effect on the physical-chemical properties of a-SiCx:H interlayers deposited by using hexamethyldisiloxane on AISI 4140 at low temperatures (85 degrees C-180 degrees C). In particular, the effect of the treatment on the adhesion of a-C:H thin films is reported. The results show that hydrogen radically modifies the tribological behavior inducing the adhesion of a-C:H thin films at temperatures as low as 85 degrees C. The adhesion's improvement is associated with the hydrogen chemical etching that seems to remove more silicon than carbon atoms from the outermost face of the a-SiCx:H interlayer promoting the formation of stronger carbon-carbon bonds. The results are also discussed showing the efficiency obtained by the use of the electrostatic confinement deposition technique. (C) 2017 Elsevier Ltd. All rights reserved.

引用

页码：243 / 246

页数：4

共 20 条

[1]

Alakoski Esa, 2008, Open Orthop J, V2, P43, DOI 10.2174/1874325000802010043

[2] Identification of the Chemical Bonding Prompting Adhesion of a-C:H Thin Films on Ferrous Alloy Intermediated by a SiCx:H Buffer Layer [J].

Cemin, F. ;

Bim, L. T. ;

Leidens, L. M. ;

Morales, M. ;

Baumvol, I. J. R. ;

Alvarez, F. ;

Figueroa, C. A. .

ACS APPLIED MATERIALS & INTERFACES, 2015, 7 (29) :15909-15917

[3] On the hydrogenated silicon carbide (SiCx:H) interlayer properties prompting adhesion of hydrogenated amorphous carbon (a-C:H) deposited on steel [J].

Cemin, F. ;

Bim, L. T. ;

Menezes, C. M. ;

Aguzzoli, C. ;

Maia da Costa, M. E. H. ;

Baumvol, I. J. R. ;

Alvarez, F. ;

Figueroa, C. A. .

VACUUM, 2014, 109 :180-183

[4] A SIMPLE-MODEL FOR THE FORMATION OF COMPRESSIVE STRESS IN THIN-FILMS BY ION-BOMBARDMENT [J].

DAVIS, CA .

THIN SOLID FILMS, 1993, 226 (01) :30-34

[5] Hydrogenated amorphous carbon thin films deposition by pulsed DC plasma enhanced by electrostatic confinement [J].

Dufrene, S. M. M. ;

Cemin, F. ;

Soares, M. R. F. ;

Aguzzoli, C. ;

Maia da Costa, M. E. H. ;

Baumvol, I. J. R. ;

Figueroa, C. A. .

SURFACE & COATINGS TECHNOLOGY, 2014, 258 :219-224

[6] New pathways in plasma nitriding of metal alloys [J].

Figueroa, CA ;

Alvarez, F .

SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4) :498-501

[7] Influence of the ion mean free path and the role of oxygen in nitriding processes [J].

Figueroa, CA ;

Ochoa, E ;

Alvarez, F .

JOURNAL OF APPLIED PHYSICS, 2003, 94 (04) :2242-2247

[8] Electrostatically Confined Plasma in Segmented Hollow Cathode Geometries for Surface Engineering [J].

Gallo, Santiago Corujeira ;

Crespi, Angela E. ;

Cemin, Felipe ;

Figueroa, Carlos A. ;

Baumvol, Israel J. R. .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) :3028-3032

[9] Diamond-like carbon: state of the art [J].

Grill, A .

[10] ENGINEERING APPLICATIONS FOR DIAMOND-LIKE CARBON [J].

MATTHEWS, A ;

ESKILDSEN, SS .

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