Decomposition mechanism of M(NEt2)4 (M = V, Cr) used as single source precursors for the MOCVD of M-C-N coatings.

被引：2
作者：
Bonnefond, P
Feurer, R
Maury, F
Reynes, A
Chansou, B
Choukroun, K
Cassoux, P
机构：
[1] Ecole Natl Super Chim, CNRS INPT, Lab Cristallochim React & Protect Mat, F-31077 Toulouse 4, France
[2] CNRS, Chim Coordinat Lab, UPR 8241, F-31077 Toulouse, France
来源：
ANNALES DE CHIMIE-SCIENCE DES MATERIAUX | 1998年 / 23卷 / 5-6期
关键词：
D O I：
10.1016/S0151-9107(99)80015-4
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Both NMR identification of the decomposition by-products of the organometallic compounds M(NEt2)(4) (M = V, Cr) and on line mass spectrometry analyses in the MOCVD reactor have been used, in relation with the main features of the films, to discuss a decomposition pathway which accounts for the lability of the NEt2 ligands and accordingly the low nitrogen content of the films.
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页码：667 / 679
页数：13
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