On the nature and propagation of errors in roughness parameters obtained from spectral analysis of atomic force microscopy topographic images

被引:3
|
作者
Chrostowski, Robert [1 ,2 ]
Mangolini, Filippo [1 ,3 ]
机构
[1] Univ Texas Austin, Texas Mat Inst, Austin, TX 78712 USA
[2] Univ Texas Austin, Mat Sci & Engn Program, Austin, TX 78712 USA
[3] Univ Texas Austin, Walker Dept Mech Engn, Austin, TX 78712 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2022年 / 40卷 / 05期
基金
美国国家科学基金会;
关键词
SURFACE-ROUGHNESS; CONTACT MECHANICS; CRYSTALLITE SIZE; RUBBER-FRICTION; MODELS; ADHESION; TRANSFORMATION; SIMULATION; REGRESSION; ALGORITHM;
D O I
10.1116/6.0001998
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Scale-dependent surface roughness strongly affects critical surface properties of materials, including adhesion, wettability, and optical/ thermal properties. As a particular example, tuning the ratio of the true to nominal area-a parameter that depends on the root mean square (RMS) local slope of the finest scales of topography-is an effective approach to tailor the wetting characteristics of solid surfaces. While power spectral density (PSD) analysis of atomic force microscopy (AFM) topographic images allows for directly assessing the scale-dependence of surface roughness, this approach to analyze AFM height maps requires power-law modeling and extrapolation of a PSD with inherently non-normal error distributions. Here, we use a Monte Carlo approach based on synthetic AFM images of known input powerlaw parameters to (1) evaluate the accuracy of fitting techniques based on the expected distribution of the PSD; (2) evaluate the error propagation from the standard errors of the fitted power-law parameters to the computed RMS slope and area ratio; and (3) evaluate the statistical power of various PSD regression techniques when differentiating surfaces. The results indicated that standard error for ordinary least squares on a log-log PSD (log OLS) underpredicts the observed variance by similar to 50%. This underprediction can be eliminated by implementing a log-link gamma regression. Moreover, when propagating the standard error to derived parameters (e.g., the RMS slope), the propagated error is generally conservative relative to the observed variance and closely predicts the observed variance when extrapolating to the finest scale. This result demonstrates the possibility of accurately estimating roughness parameters that are critical for evaluating surface phenomena on the basis of fitting and extrapolating AFM data using self-affine models. Finally, our results provided evidence for the possibility of statistically differentiating surfaces with similar power-law parameters when using weighted gamma regression with a mean of 10 images, as opposed to unweighted log-OLS that requires as many as 10 000 images to differentiate images. Published under an exclusive license by the AVS.
引用
收藏
页数:14
相关论文
共 50 条
  • [1] Enhancement of topographic images obtained in liquid media by atomic force microscopy
    Kim, Younghun
    Yi, Jongheop
    JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (41): : 20526 - 20532
  • [2] Topographic Contrast in Force Modulation Atomic Force Microscopy Images
    Yang, Chunlai
    Zheng, Cheng
    Chen, Yuhang
    Huang, Wenhao
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (05)
  • [3] Roughness parameters of surfaces by atomic force microscopy
    Danish Inst of Fundamental Metrology
    CIRP Ann Manuf Technol, 1 (517-522):
  • [4] Spectral Analysis of Irregular Roughness Artifacts Measured by Atomic Force Microscopy and Laser Scanning Microscopy
    Chen, Yuhang
    Luo, Tingting
    Ma, Chengfu
    Huang, Wenhao
    Gao, Sitian
    MICROSCOPY AND MICROANALYSIS, 2014, 20 (06) : 1682 - 1691
  • [5] Influence of atomic force microscopy acquisition parameters on thin film roughness analysis
    Hristu, Radu
    Stanciu, Stefan G.
    Stanciu, George A.
    Capan, Inci
    Guner, Burcu
    Erdogan, Matem
    MICROSCOPY RESEARCH AND TECHNIQUE, 2012, 75 (07) : 921 - 927
  • [6] Monte-Carlo evaluation of bias and variance in Hurst exponents computed from power spectral analysis of atomic force microscopy topographic images
    Chrostowski, Robert
    Li, Zixuan
    Smith, James
    Mangolini, Filippo
    APPLIED SURFACE SCIENCE, 2022, 581
  • [7] Particular artifacts of topographic images of dielectrics in atomic-force microscopy
    Tolstikhina, A. L.
    Gainutdinov, R. V.
    Zanaveskin, M. L.
    Sorokina, K. L.
    Belugina, N. V.
    Grishchenko, Yu. V.
    CRYSTALLOGRAPHY REPORTS, 2007, 52 (05) : 894 - 900
  • [8] Identification of motion parameters from images produced by atomic force microscopy
    Sakyte, E.
    Saunoriene, L.
    Ragulskis, M.
    Maskeliunas, R.
    JOURNAL OF VIBROENGINEERING, 2008, 10 (02) : 184 - 190
  • [9] Particular artifacts of topographic images of dielectrics in atomic-force microscopy
    A. L. Tolstikhina
    R. V. Gaĭnutdinov
    M. L. Zanaveskin
    K. L. Sorokina
    N. V. Belugina
    Yu. V. Grishchenko
    Crystallography Reports, 2007, 52 : 894 - 900
  • [10] Influence of gains on the quality of topographic images based on atomic force microscopy
    Key Laboratory of Micro-Nano Materials for Energy Storage and Conversion of Henan Province, Institute of Surface Micro and Nano Materials, Xuchang University, Xuchang, China
    J. Adv. Microso. Res., 1 (50-53):