Eosin Y-Sensitized Photocatalytic Reaction of Tertiary Aliphatic Amines with Arenesulfonyl Chlorides under Visible-Light Irradiation

被引：21
作者：
Cai, Yuguo [1 ,2 ]
Zhang, Ronghua [1 ,2 ]
Sun, Deli [1 ,2 ]
Xu, Song [1 ,2 ]
Zhou, Qiguang [1 ,2 ]
机构：
[1] Tongji Univ, Sch Chem Sci & Engn, 1239 Siping Rd, Shanghai 200092, Peoples R China
[2] Tongji Univ, Shanghai Key Lab Chem Assessment & Sustainabil, 1239 Siping Rd, Shanghai 200092, Peoples R China
来源：
SYNLETT | 2017年 / 28卷 / 13期
关键词：
vinyl sulfones; sulfonamides; eosin Y; photoredox catalysis; amines; arenesulfonyl chlorides; VINYL SULFONATE ESTERS; C-H FUNCTIONALIZATION; PHOTOREDOX CATALYSIS; OXIDATIVE HYDROXYLATION; ARYLBORONIC ACIDS; RADICAL-ADDITION; BOND-CLEAVAGE; METAL-FREE; TIN-FREE; EFFICIENT;
D O I：
10.1055/s-0036-1588828
中图分类号：
O62 [有机化学];
学科分类号：
070303 ; 081704 ;
摘要：
A mild, practical, and environmentally friendly route to vinyl sulfones and sulfonamides has been developed based on the reaction of aliphatic amines with arenesulfonyl chlorides in the presence of eosin Y as a photocatalyst under visible light. The method permits the selective formation of vinyl sulfones or sulfonamides, depending on the oxidation environment and solvent. A wide range of products were obtained in moderate to good yields under the optimized conditions.
引用
收藏
页码：1630 / 1635
页数：6
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