Spatial nonuniformities in the minority-carrier diffusion length lifetime: Measurement and implications on a large area device performance

被引:0
作者
Sopori, BL [1 ]
Chen, W [1 ]
Symko, M [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
来源
RECOMBINATION LIFETIME MEASUREMENTS IN SILICON | 1998年 / 1340卷
关键词
minority carrier lifetime; diffusion length; photovoltaic silicon; surface recombination velocity;
D O I
10.1520/STP15716S
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Measurement of the minority-carrier diffusion length (L) or lifetime (tau) in a nonuniform material, such as a photovoltaic (PV) silicon substrate, can pose major challenges. In general, a measured value is meaningful only if the size of the probe beam much greater than L, and the material is uniform in and around the region of measurement. When the measurement conditions differ from these, there is a net flow of generated carriers from the illuminated region into the unilluminated region, and/or an exchange of carriers within the neighboring regions. In these cases, the error can arise from two mechanisms: (i) recombination at the surface, and (ii) exchange of carriers within regions of different diffusion lengths. These errors can be minimized by the proper selection of the carrier generation conditions and sample preparation. By combining the experimental results with less rigorous theoretical analyses, the conditions for the measurement of local values oft (or tau) in a PV substrate can be determined. A network model can be used to integrate the influence of spatial distribution of L-values on a nonuniform substrate and predict the electrical characteristics of the large-area device fabricated on it.
引用
收藏
页码:328 / 343
页数:16
相关论文
共 5 条
[1]  
AHRENKIEL RK, 1996, AIP C P, V394, P225
[2]   SOME INVESTIGATIONS ON THE INFLUENCE OF DEFECTS-GRAIN BOUNDARIES ON PHOTO-VOLTAIC MECHANISMS IN POLYCRYSTALLINE SILICON FILMS [J].
SOPORI, BL ;
BAGHDADI, A .
SOLAR CELLS, 1980, 1 (03) :237-250
[3]   EFFECTS OF OPTICAL BEAM SIZE ON DIFFUSION LENGTH MEASURED BY THE SURFACE PHOTO-VOLTAGE METHOD [J].
SOPORI, BL ;
GURTLER, RW ;
LESK, IA .
SOLID-STATE ELECTRONICS, 1980, 23 (02) :139-142
[4]  
SOPORI BL, 1994, P 12 EUR PHOT SOL EN, P1797
[5]  
SOPORI BL, 1996, Patent No. 5581346