Thermal calibration procedure for internal infrared laser deflection apparatus -: art. no. 094905

被引:5
作者
Perpiñà, X
Jordà, X
Madrid, F
Flores, D
Hidalgo, S
Vellvehi, M
Mestres, N
机构
[1] CSIC, IMB, CNM, Barcelona 08193, Spain
[2] CSIC, ICMAB, Barcelona 08193, Spain
关键词
D O I
10.1063/1.2039687
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A procedure to calibrate the temperature measurements in the transient regime of internal IR-laser deflection (IIR-LD) apparatus is presented. For this purpose, a thermal test chip (TTC), whose behavior is analytically well described by a simple model, is used. During the calibration process, the TTC is thermally excited during short heating times (up to 250 mu s), estimating its internal temperature profile by IIR-LD measurements. Afterwards, experimental results and model predictions are compared. Good agreement between theory and experiment is found when a temperature rise ranging from 0 to 1.4 K is measured. The presented procedure can be also used to thermally calibrate optical probing apparatus for measuring the thermal behavior of power devices, as well as to determine thermal parameters of other materials, such as SiC and GaN. In particular, it should be very useful for the determination of the thermo-optical coefficient (partial derivative n/partial derivative T)(C) of such materials. In the present work, a value for (partial derivative n/partial derivative T)(C) of 2.0x10(-4) K-1 is found in silicon, which agrees with literature reported values. The benefits of this method are its simplicity, accuracy, and low time consumption. (c) 2005 American Institute of Physics.
引用
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页数:5
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