Simple models for film growth by energetic cluster impact

被引:5
作者
Moseler, M [1 ]
Nordiek, J [1 ]
Rattunde, O [1 ]
Haberland, H [1 ]
机构
[1] Freiburg Mat Res Ctr, D-79104 Freiburg, Germany
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1997年 / 142卷 / 1-4期
关键词
growth; surface roughening; thin films; cluster-surface collisions; atomic force microscope;
D O I
10.1080/10420159708211595
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
The evolution of the surface roughness of films produced by cluster deposition was studied experimentally and theoretically. Simple models were developed from a molecular dynamic description of cluster impact. For low cluster kinetic energy a ballistic model was established, which reproduced the interface width of experimental films very well. Since an energetic cluster impact induces a strong plastic flow, a rough impact region is smoothed and a small crater remains. Therefore a model for the energetic impact was developed, consisting of a smooth operator applied on the initial interface profile and the superposition of a crater term. The simulation as well as atomic force microscopy data displayed the same linear relation in a semilogarithmic plot of squared interface width vs film thickness. Simulated and experimental height profiles showed the same spatial correlation pattern. It is concluded that the Kardar-Parisi-Zhang equation is applicable to cluster deposition films and that with increasing impact energy the Edwards-Wilkinson limit is reached.
引用
收藏
页码:39 / 50
页数:12
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