Tunable piezoresistance and noise in gate-all-around nanowire field-effect-transistor

被引:15
作者
Singh, Pushpapraj [1 ,2 ]
Park, Woo-Tae [2 ]
Miao, Jianmin [1 ,2 ]
Shao, Lichun [2 ]
Kotlanka, Rama Krishna [2 ]
Kwong, Dim-Lee [2 ]
机构
[1] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore 639798, Singapore
[2] ASTAR, Inst Microelect, Singapore 117685, Singapore
关键词
field effect transistors; nanowires; piezoresistance; semiconductor device noise; GIANT PIEZORESISTANCE; SILICON NANOWIRES; LAYERS; CMOS;
D O I
10.1063/1.3683516
中图分类号
O59 [应用物理学];
学科分类号
摘要
The piezoresistance and noise of n-type gate-all-around nanowire field-effect-transistor (NWFET) is investigated as a function of gate bias. With narrow gate bias span of 0.6 V near threshold region, the piezoresistive coefficient of NWFET enhances up to seven times from 29 x 10(-11) Pa-1 to 207 x 10(-11) Pa-1 under compressive and tensile strain conditions. Results reveal that the low frequency noise is reduced when operated in subthreshold region. The higher piezoresistive coefficient and reduced noise improve the sensor resolution (minimum detectable strain) by sixteen times. NWFET operates at low bias with higher piezoresistance and signal-to-noise ratio and offers promising applications in strain sensors. (C) 2012 American Institute of Physics. [doi:10.1063/1.3683516]
引用
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页数:4
相关论文
共 16 条
  • [1] Review: Semiconductor Piezoresistance for Microsystems
    Barlian, A. Alvin
    Park, Woo-Tae
    Mallon, Joseph R., Jr.
    Rastegar, Ali J.
    Pruitt, Beth L.
    [J]. PROCEEDINGS OF THE IEEE, 2009, 97 (03) : 513 - 552
  • [2] Piezoresistive characteristics of short-channel MOSFETs on (100) silicon
    Bradley, AT
    Jaeger, RC
    Suhling, JC
    O'Connor, KJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (09) : 2009 - 2015
  • [4] Giant piezoresistance effect in silicon nanowires
    He, Rongrui
    Yang, Peidong
    [J]. NATURE NANOTECHNOLOGY, 2006, 1 (01) : 42 - 46
  • [5] Signal-to-Noise Ratio in Carbon Nanotube Electromechanical Piezoresistive Sensors
    Helbling, Thomas
    Roman, Cosmin
    Hierold, Christofer
    [J]. NANO LETTERS, 2010, 10 (09) : 3350 - 3354
  • [6] STRESS-SENSITIVE PROPERTIES OF SILICON-GATE MOS DEVICES
    MIKOSHIBA, H
    [J]. SOLID-STATE ELECTRONICS, 1981, 24 (03) : 221 - 232
  • [7] Giant Piezoresistance Effects in Silicon Nanowires and Microwires
    Milne, J. S.
    Rowe, A. C. H.
    Arscott, S.
    Renner, Ch.
    [J]. PHYSICAL REVIEW LETTERS, 2010, 105 (22)
  • [8] Electrically Controlled Giant Piezoresistance in Silicon Nanowires
    Neuzil, Pavel
    Wong, Chee Chung
    Reboud, Julien
    [J]. NANO LETTERS, 2010, 10 (04) : 1248 - 1252
  • [9] PIEZORESISTANCE EFFECT IN GERMANIUM AND SILICON
    SMITH, CS
    [J]. PHYSICAL REVIEW, 1954, 94 (01): : 42 - 49
  • [10] Takagi S, 2002, IEICE T ELECTRON, VE85C, P1064