Electrical conduction control of carbon nanowalls

被引：90

作者：

Takeuchi, Wakana ^{[1
]}

Ura, Masato ^{[1
]}

Hiramatsu, Mineo ^{[2
]}

Tokuda, Yutaka ^{[3
]}

Kano, Hiroyuki ^{[4
]}

Hori, Masaru ^{[1
]}

机构：

[1] Nagoya Univ, Dept Elect Engn & Comp Sci, Nagoya, Aichi 4688603, Japan

[2] Meijo Univ, Dept Elect & Elect Engn, Nagoya, Aichi 4688502, Japan

[3] Aichi Inst Technol, Dept Elect & Elect Engn, Toyota 4700392, Japan

[4] NU Eco Engn Co Ltd, Miyoshi, Nishikamo 4700201, Japan

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 21期

关键词：

D O I：

10.1063/1.2936850

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The electrical conduction behavior of carbon nanowalls (CNWs) has been evaluated by Hall measurement. CNWs, which comprise stacks of graphene sheets standing on the substrate, are fabricated by fluorocarbon/hydrogen plasma enhanced chemical vapor deposition. We have investigated the effect of N-2 addition to C2F6/H-2 system on the electrical properties of CNWs. The CNWs grown with the C2F6/H-2 plasma exhibit p-type conduction. As a result of the nitrogen inclusion in the CNWs, the conduction type of the CNWs changes to n type. The carrier concentration is controllable by changing the flow rate of the additional N-2 during the CNW growth process. (c) 2008 American Institute of Physics.

引用

页数：3

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