ZnO Schottky ultraviolet photodetectors

被引:872
作者
Liang, S
Sheng, H
Liu, Y
Huo, Z
Lu, Y
Shen, H
机构
[1] Rutgers State Univ, Dept Elect & Comp Engn, Piscataway, NJ 08854 USA
[2] USA, Res Lab, Adelphi, MD 20783 USA
关键词
metalorganic chemical vapor deposition; ZnO; semiconducting IIVI materials; photodetector;
D O I
10.1016/S0022-0248(01)00830-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We present the results of Schottky UV photodetectors fabricated on n-tyPe ZnO epitaxial films. The ZnO films were grown on R-plane sapphire substrates by metalorganic chemical vapor deposition. The metal-semiconductor-metal (MSM) photodetectors were fabricated by using Ag os Schottky contact metal. For comparison, ZnO photoconductive detectors were also fabricated by using Al as ohmic contact metal. 1 V characteristics of these devices were analyzed. At a reverse bias of 1V, the circular Schottky photodiode exhibits a leakage current approximately 5 orders of magnitude smaller than that of its photoconductive counterpart. The photoresponsivity of the ZnO Schottky type MSM UV detector is 1.5 A/W and the leakage current is about 1 nA at 5 V bias. The detector shows a fast photoresponse component with a rise time of 12 ns and a hill time of 50 ns. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:110 / 113
页数:4
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