Introduction of helium into metals by magnetron sputtering deposition method

被引:25
作者
Zheng, H [1 ]
Liu, S
Yu, HB
Wang, LB
Liu, CZ
Shi, LQ
机构
[1] Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
[2] Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China
基金
中国国家自然科学基金;
关键词
helium; Ti film; magnetron sputtering; thermodesorption;
D O I
10.1016/j.matlet.2004.12.008
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4 He are similar to those of radiogenic He-3 in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti-He films. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1071 / 1075
页数:5
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