STM/STS studies of the structural phase transition in the growth of ultra-thin Bi films on Si(111)

被引:1
作者
Sadowski, JT
Nagao, T
Saito, M
Oreshkin, A
Yaginuma, S
Hasegawa, S
Ohno, T
Sakurai, T
机构
[1] Tohoku Univ, Mat Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Natl Inst Mat Sci, Computat Mat Sci Ctr, Tsukuba, Ibaraki 3050047, Japan
[3] Univ Tokyo, Grad Sch Sci, Dept Phys, Bunkyo Ku, Tokyo 1130033, Japan
[4] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119992, Russia
关键词
D O I
10.12693/APhysPolA.104.381
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Growth of thin metal films on semiconductors has been always an important subject for extensive experimental and theoretical studies. As the applicability of well-ordered nanostructures in electronic applications depends strongly on their size and distribution, it is necessary to understand, the processes that govern the growth of such structures. In this paper we present the results of investigation of the room temperature growth of thin Bi film on Si(111). In our study we clarified that rotationally disordered, pseudo-cubic Bi{012} islands with uniform height of approximate to 13 Angstrom are formed in the initial stage of Bi film growth. With increase in the amount of bismuth on the surface, islands interconnect maintaining however their uniform height. This process is further accompanied by the unique and unexpected structural phase transition of the {012} film into a hexagonal Bi(001) film.
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收藏
页码:381 / 387
页数:7
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