Determination the Optical Constants of Hafnium Oxide Film by Spectroscopic Ellipsometry with Various Dispersion Models

被引:1
作者
Gao, Weidong [1 ]
Zhang, Yinhua [1 ]
Liu, Hongxiang [1 ]
机构
[1] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Si Chuan, Peoples R China
来源
5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTICAL TEST AND MEASUREMENT TECHNOLOGY AND EQUIPMENT | 2010年 / 7656卷
关键词
HfO(2); Film; Spectroscopic ellipsometry; Optical constants; DIELECTRICS; MIRRORS;
D O I
10.1117/12.865979
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Optical constants of vacuum-deposited hafnium oxide film (HfO(2)) from infrared to ultraviolet spectral region (215nm-1700nm) have been determined by variable angle Spectroscopic ellipsometry with Cauchy dispersion model, Sellmeier dispersion model, Cauchy-Urbach dispersion model and Tauc-Lorentz dispersion model, respectively. The optical constants of the HfO(2) film which were extracted with the four dispersion models have been compared. The surface roughness layer between HfO(2) film and air and the interface layer between the film and the substrate have also been modeled with Bruggeman effective medium approximation (BEMA).
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页数:8
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共 11 条
  • [1] HfO2 films with high laser damage threshold
    Alvisi, M
    Di Giulio, M
    Marrone, SG
    Perrone, MR
    Protopapa, ML
    Valentini, A
    Vasanelli, L
    [J]. THIN SOLID FILMS, 2000, 358 (1-2) : 250 - 258
  • [2] ASPENS DE, 1979, PHYS REV B, V20, P3292
  • [3] Autron J.L., 2004, HIGH K GATE DIELECTR
  • [4] Al2O3/SiO2 and HfO2/SiO2 dichroic mirrors for UV solid-state lasers
    Grilli, Maria Luisa
    Menchini, Francesca
    Piegari, Angela
    Alderighi, Daniele
    Toci, Guido
    Vannini, Matteo
    [J]. THIN SOLID FILMS, 2009, 517 (05) : 1731 - 1735
  • [5] Parameterization of the optical functions of amorphous materials in the interband region
    Jellison, GE
    Modine, FA
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (03) : 371 - 373
  • [6] Alternative dielectrics to silicon dioxide for memory and logic devices
    Kingon, AI
    Maria, JP
    Streiffer, SK
    [J]. NATURE, 2000, 406 (6799) : 1032 - 1038
  • [7] Levenberg K., 1944, Q APPL MATH, V2, P164, DOI [10.1090/qam/10666, DOI 10.1090/QAM/10666]
  • [8] Marquardt D., 1963, SIAM J APPL MATH, V11, P431, DOI [DOI 10.1137/0111030, 10.1137/0111030]
  • [9] Tompkins H.G., 1999, Spectroscopic Ellipsometry and Reflectometry: A User's Guide, P93
  • [10] High-reflectivity HfO2/SiO2 ultraviolet mirrors
    Torchio, P
    Gatto, A
    Alvisi, M
    Albrand, G
    Kaiser, N
    Amra, C
    [J]. APPLIED OPTICS, 2002, 41 (16) : 3256 - 3261