共 50 条
- [41] Process-induced particle formation in the sputtering and reactive ion etching of silicon and silicon dioxide PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03): : 273 - 277
- [42] Plasma etching process induced poly film damage 1997 2ND INTERNATIONAL SYMPOSIUM ON PLASMA PROCESS-INDUCED DAMAGE, 1997, : 77 - 80
- [44] Surface damage formation during atomic layer etching of silicon with chlorine adsorption JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, 39 (04):
- [45] PROCESS-INDUCED DEFECTS IN VLSI NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 55 (1-4): : 124 - 131
- [46] A novel transient current technique to characterize process-induced thin oxide damage 55TH ANNUAL DEVICE RESEARCH CONFERENCE, DIGEST - 1997, 1997, : 26 - 27
- [47] Extraction of process-induced damage in low-k/Cu damascene structure ISSM 2005: IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, CONFERENCE PROCEEDINGS, 2005, : 422 - 425
- [48] Fabrication of silicon-based PZT films and process-induced damage problems Qinghua Daxue Xuebao/Journal of Tsinghua University, 2003, 43 (04): : 557 - 560
- [50] Plasma process-induced damage to Josephson tunnel junctions in superconducting integrated circuits SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2007, 20 (11): : S341 - S349