Reduction of Process-induced damage in atomic layer etching

被引：0
|
作者：
Hirata, Akiko [1 ]
机构：
[1] Sony Semicond Solut Corp, 4-14-1 Asahi Cho, Atsugi, Kanagawa 2430014, Japan
来源：
TWENTIETH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT 2021) | 2021年
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D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：25 / 26
页数：2
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