Development of new mask-less manufacturing method for anti-reflection structure and application to large area lens with curved surface

被引:0
作者
Yamamoto, Kazuya [1 ]
Takaoka, Toshimitsu [1 ]
Fukui, Hidetoshi [1 ]
Haruta, Yasuyuki [1 ]
Yamashita, Tomoya [1 ]
Kitagawa, Seiichiro [1 ]
机构
[1] NALUX CO LTD, Yamazaki 2-1-7, Shimamoto, Osaka 6180001, Japan
来源
PHYSICS AND SIMULATION OF OPTOELECTRONIC DEVICES XXIV | 2016年 / 9742卷
关键词
Anti-reflection; Sub-wavelength structure; mask-less method;
D O I
10.1117/12.2213776
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In general, thin-film coating process is widely applied on optical lens surface as anti-reflection function. In normal production process, at first lens is manufactured by molding, then anti-reflection is added by thin-film coating. In recent years, instead of thin-film coating, sub-wavelength structures adding on surface of molding die are widely studied and development to keep anti-reflection performance. As merits, applying sub-wavelength structure, coating process becomes unnecessary and it is possible to reduce man-hour costs. In addition to cost merit, these are some technical advantages on this study. Adhesion of coating depends on material of plastic, and it is impossible to apply anti-reflection function on arbitrary surface. Sub-wavelength structure can solve both problems. Manufacturing method of anti-reflection structure can be divided into two types mainly. One method is with the resist patterning, and the other is mask-less method that does not require patterning. What we have developed is new mask-less method which is no need for resist patterning and possible to impart an anti-reflection structure to large area and curved lens surface, and can be expected to apply to various market segments. We report developed technique and characteristics of production lens.
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页数:9
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