Effects of the rear interface states and fixed charges on the electrical characteristics of thin film transistors with thin amorphous silicon layers

被引:1
作者
Tai, YH
Su, FC
Feng, MS
Cheng, HC
机构
[1] NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
[2] UNIPAC OPTOELECTR CORP,HSINCHU,TAIWAN
[3] NATL CHIAO TUNG UNIV,INST MAT SCI & ENGN,HSINCHU,TAIWAN
关键词
D O I
10.1016/0038-1101(95)00271-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical characteristics of the thin film transistors (TFT's) with hydrogenated amorphous silicon (a-Si:H) films thinner than 0.1 mu m have been carefully studied to show that the interface states and fixed charges at the rear interface will play the comparable effects to those at the front interface on the field effect conductance. It is dearly demonstrated that as the thickness of the active layer is smaller than the theoretically expected width of the space charge region, the potential at the rear interface will be affected by the gate voltage. This is very different from the conventional case with a thicker active layer. Since the TFT's at present have smaller typical thicknesses of the semiconductor films than the expected width of the space charge region, the effects of the interface states and the fixed charges at both the rear and front interfaces, as well as the bulk states of the thin a-Si:H films, must be taken into account concurrently.
引用
收藏
页码:901 / 908
页数:8
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