Etching rate and structural modification of polymer films during low energy ion irradiation

被引:34
作者
Zaporojtchenko, V [1 ]
Zekonyte, J [1 ]
Erichsen, J [1 ]
Faupel, F [1 ]
机构
[1] Univ Kiel, Tech Fac, Chair Multicomponent Mat, D-24143 Kiel, Germany
关键词
ion irradiation effects; polymers; glass transition; X-ray photoelectron spectra - surface analysis;
D O I
10.1016/S0168-583X(03)00625-6
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Various polymers were sputtered with low energy Ar+ ions of 1 keV in order to determine their etching rate. Hydrocarbons, oxygenated, fluorinated and nitrogen-containing glassy polymers with a broad range of the glass transition temperature (T-g,) were chosen. The etching rate was measured using a profilometer, and X-ray photoelectron spectroscopy. At the same time the surface chemical modification, and the surface glass transition temperature were studied. Comparing the sputter rate to the various polymer properties a correlation among the T-g, cross-link density, and sputter rate was found. In addition, the sputter rate as a function of the integral ion fluence proved to exhibit a sharp increase in the initial regime of very low fluence. The results are discussed in terms of the characteristics of the polymers. (C) 2003 Elsevier B,V. All rights reserved.
引用
收藏
页码:155 / 160
页数:6
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