The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

被引:83
作者
Lisco, F. [1 ]
Kaminski, P. M. [1 ]
Abbas, A. [1 ]
Bass, K. [1 ]
Bowers, J. W. [1 ]
Claudio, G. [1 ]
Losurdo, M. [2 ]
Walls, J. M. [1 ]
机构
[1] Univ Loughborough, CREST, Sch Elect Elect & Syst Engn, Loughborough LE11 3TU, Leics, England
[2] CNR, IMIP, Inst Inorgan Methodol & Plasmas, I-70126 Bari, Italy
基金
英国工程与自然科学研究理事会;
关键词
Pulsed direct-current magnetron sputtering; Chemical bath deposition; Cadmium sulphide; Thin films; Film uniformity; Pinhole free films; Void-free films; THIN-FILMS; OPTICAL-PROPERTIES;
D O I
10.1016/j.tsf.2014.11.062
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grownCBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. (C) 2014 The Authors. Published by Elsevier B.V.
引用
收藏
页码:323 / 327
页数:5
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