Coverage analysis of a sulfur-terminated GaAs(001)-(2x6) surface: the effect of double sulfur-treatment

被引:10
|
作者
Shimoda, M [1 ]
Tsukamoto, S [1 ]
Koguchi, N [1 ]
机构
[1] Natl Res Inst Met, Tsukuba, Ibaraki 305, Japan
关键词
Auger electron spectroscopy; coverage; gallium arsenide; photoelectron spectroscopy; semiconducting surface;
D O I
10.1016/S0039-6028(97)00937-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Sulfur-terminated GaAs(001)-(2 x 6) surfaces have been investigated by photoelectron and Auger electron spectroscopy. Surface coverages of S and As are estimated from the angle dependence of electron emission to evaluate the effect of double S-treatment, which is a preparation technique developed by Tsukamoto et al. It is found that a large amount of As remains on the surface after the first S-treatment and that a large portion of the residual As is replaced with S in the second S-treatment. This fact explains the results of the scanning tunneling microscopy observation that the surface homogeneity is significantly improved by the double S-treatment. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:669 / 672
页数:4
相关论文
共 50 条
  • [1] Photoelectron and Auger electron diffraction studies of a sulfur-terminated GaAs(001)-(2x6) surface
    Shimoda, M
    Tsukamoto, S
    Koguchi, N
    SURFACE SCIENCE, 1998, 395 (01) : 75 - 81
  • [2] OBSERVATION OF SULFUR-TERMINATED GAAS(001)-(2X6) RECONSTRUCTION BY SCANNING-TUNNELING-MICROSCOPY
    TSUKAMOTO, S
    KOGUCHI, N
    APPLIED PHYSICS LETTERS, 1994, 65 (17) : 2199 - 2201
  • [3] 2X6 SURFACE RECONSTRUCTION OF IN-SITU SULFUR-TERMINATED GAAS(001) OBSERVED BY SCANNING-TUNNELING-MICROSCOPY
    TSUKAMOTO, S
    KOGUCHI, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (8B): : L1185 - L1188
  • [4] Highly reactive organopalladium catalyst formed on sulfur-terminated GaAs(001)-(2 x 6) surface
    Takamiya, Ikuko
    Tsukamoto, Shiro
    Shimoda, Masahiko
    Arisawa, Mitsuhiro
    Nishida, Atsushi
    Arakawa, Yasuhiko
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2006, 45 (17-19): : L475 - L477
  • [5] Highly reactive organopalladium catalyst formed on sulfur-terminated GaAs(001)-(2 × 6) surface
    Takamiya, Ikuko
    Tsukamoto, Shiro
    Shimoda, Masahiko
    Arisawa, Mitsuhiro
    Nishida, Atsushi
    Arakawa, Yasuhiko
    Japanese Journal of Applied Physics, Part 2: Letters, 2006, 45 (17-19):
  • [6] Novel organopalladium material formed on a sulfur-terminated GaAs(001) surface
    Arisawa, Mitsuhiro
    Tsukamoto, Shiro
    Shimoda, Masahiko
    Pristovsek, Markus
    Nishida, Atsushi
    1600, Japan Society of Applied Physics (41):
  • [7] Novel organopalladium material formed on a sulfur-terminated GaAs(001) surface
    Arisawa, M
    Tsukamoto, S
    Shimoda, M
    Pristovsek, M
    Nishida, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2002, 41 (11A): : L1197 - L1199
  • [8] Organopalladium catalyst on S-terminated GaAs(001)-(2x6) surface
    Konishi, Tomoya
    Toujyou, Takashi
    Ishikawa, Takuma
    Bell, Gavin R.
    Tsukamotoa, Shiro
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (05): : 2206 - 2208
  • [9] Surface structure of sulfur-terminated GaAs by medium energy ion scattering
    Takai, M
    Taketani, M
    Yokoi, N
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 118 (1-4): : 552 - 555
  • [10] Structural and Electronic Properties of Sulfur-Passivated InAs(001) (2x6) Surface
    Li Deng-Feng
    Guo Zhi-Cheng
    Li Bo-Lin
    Dong Hui-Ning
    Xiao Hai-Yan
    CHINESE PHYSICS LETTERS, 2011, 28 (08)