EUV emission of solid targets irradiated by femto- and picosecond laser pulses

被引：0

作者：

Soumagne, G ^{[1
]}

Abe, T ^{[1
]}

Ikeda, K ^{[1
]}

Komori, H ^{[1
]}

Someya, H ^{[1
]}

Suganuma, T ^{[1
]}

Nakajima, K ^{[1
]}

Endo, A ^{[1
]}

机构：

[1] Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan

来源：

FOURTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 5063卷

关键词：

EUV emission; laser-produced plasma; solid target; plasma emission;

D O I：

10.1117/12.541149

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Various solid materials have been irradiated with laser intensities ranging from 10(11) to 10(16) W/cm(2) and the plasma emission has been measured between 7 nm. and 18 nm. A chirped pulse amplified Ti:Sapphire laser oscillating at 790 rim with either 100 fs or 300 ps pulse duration and a Nd:YAG laser oscillating at 1064 rim with 10 ns pulse duration (fwhm) have been used. Tin, aluminum and copper have been chosen as targets. It has been found that the plasma emission was strongest for the 300 ps laser pulse irradiation. This might be due to the additional laser plasma heating during plasma formation.

引用

页码：274 / 277

页数：4

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