Hard X-ray nano-focusing with Montel mirror optics

被引：8

作者：

Liu, Wenjun ^{[1
]}

Ice, Gene E. ^{[2
]}

Assoufid, Lahsen ^{[1
]}

Liu, Chian ^{[1
]}

Shi, Bing ^{[1
]}

Zschack, Paul ^{[1
]}

Tischler, Jon ^{[2
]}

Qian, Jun ^{[1
]}

Khachartryan, Ruben ^{[1
]}

Shu, Deming ^{[1
]}

机构：

[1] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA

[2] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2011年 / 649卷 / 01期

关键词：

Montel mirrors; Hard X-ray nano-focusing; Achromatic;

D O I：

10.1016/j.nima.2010.11.080

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Kirkpatrick-Baez mirrors in the Montel (or nested) configuration were tested for hard X-ray nanoscale focusing at a third generation synchrotron beamline. In this scheme, two mirrors, mounted side-by-side and perpendicular to each other, provide for a more compact focusing system and a much higher demagnification and flux than the traditional sequential K-B mirror arrangement, They can accept up to a 120 mu m x 120 mu m incident X-ray beam with a long working distance of 40 mm and broad-bandpass of energies up to similar to 30 keV. Initial test demonstrated a focal spot of about 150 nm in both horizontal and vertical directions with either polychromatic or monochromatic beam. Montel mirror optics is important and very appealing for achromatic X-ray nanoscale focusing in conventional non-extra-long synchrotron beamlines. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：169 / 171

页数：3