Hard X-ray nano-focusing with Montel mirror optics

被引:8
|
作者
Liu, Wenjun [1 ]
Ice, Gene E. [2 ]
Assoufid, Lahsen [1 ]
Liu, Chian [1 ]
Shi, Bing [1 ]
Zschack, Paul [1 ]
Tischler, Jon [2 ]
Qian, Jun [1 ]
Khachartryan, Ruben [1 ]
Shu, Deming [1 ]
机构
[1] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA
[2] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA
来源
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2011年 / 649卷 / 01期
关键词
Montel mirrors; Hard X-ray nano-focusing; Achromatic;
D O I
10.1016/j.nima.2010.11.080
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Kirkpatrick-Baez mirrors in the Montel (or nested) configuration were tested for hard X-ray nanoscale focusing at a third generation synchrotron beamline. In this scheme, two mirrors, mounted side-by-side and perpendicular to each other, provide for a more compact focusing system and a much higher demagnification and flux than the traditional sequential K-B mirror arrangement, They can accept up to a 120 mu m x 120 mu m incident X-ray beam with a long working distance of 40 mm and broad-bandpass of energies up to similar to 30 keV. Initial test demonstrated a focal spot of about 150 nm in both horizontal and vertical directions with either polychromatic or monochromatic beam. Montel mirror optics is important and very appealing for achromatic X-ray nanoscale focusing in conventional non-extra-long synchrotron beamlines. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:169 / 171
页数:3
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