Tailoring the optical properties of SrBi4Ti4O15 thin films by RF sputtering process parameters

被引:1
|
作者
Rambabu, A. [1 ]
Raju, K. C. James [2 ]
机构
[1] GMR Inst Technol, Dept Basic Sci & Humanities, Rajam 532127, Andhra Pradesh, India
[2] Univ Hyderbad, PO Cent Univ, Scool Phys, Hyderabad 500046, Telangana, India
关键词
Thin films; RF sputtering; Optical properties; Oxygen mixing percentage; Electro-optic devices; DIELECTRIC-PROPERTIES;
D O I
10.1016/j.matpr.2021.05.254
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
SrBi4Ti4O15 is a bismuth layered perovskite structure material, its thin film form gained much interest due to their geometrical flexibility and thickness. In the present study, SrBi4Ti4O15 thin films are deposited on amorphous substrate using radio frequency sputtering technique. SrBi4Ti4O15 thin films found to be single phase orthorhombic structure by using X-ray diffraction technique. Surface morphology studies such as grain size, shape and roughness were explored through atomic force microscopy. EDX analysis identified the individual elements and its percentage in the compound. Optical properties (refractive index and bandgap) were determined with varying the oxygen mixing percentage (OMP). The best optical properties (refractive index similar to 2.35 and bandgap similar to 3.4 eV) were obtained for films deposited at 50% OMP. These results shows the potential of using SrBi4Ti4O15 thin films in electro-optic devices. (C) 2021 Elsevier Ltd. All rights reserved.
引用
收藏
页码:4413 / 4417
页数:5
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