The case for nonporous low-k dielectrics

被引：0
|
作者：
Rantala, JT [1 ]
McLaughlin, W [1 ]
Reid, JS [1 ]
Beery, D [1 ]
Hacker, NP [1 ]
机构：
[1] Silecs Inc, San Jose, CA USA
来源：
SOLID STATE TECHNOLOGY | 2003年 / 46卷 / 12期
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
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页码：34 / +
页数：2
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