The case for nonporous low-k dielectrics

被引：0

作者：

Rantala, JT ^{[1
]}

McLaughlin, W ^{[1
]}

Reid, JS ^{[1
]}

Beery, D ^{[1
]}

Hacker, NP ^{[1
]}

机构：

[1] Silecs Inc, San Jose, CA USA

来源：

SOLID STATE TECHNOLOGY | 2003年 / 46卷 / 12期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：34 / +

页数：2

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