Influence of photoreactivating light intensity and incubation temperature on photoreactivation of Escherichia coli following LP and MP UV disinfection

被引:37
作者
Quek, P. H. [1 ]
Hu, J. [1 ]
机构
[1] Natl Univ Singapore, Fac Engn, Div Environm Sci & Engn, Singapore 117576, Singapore
关键词
Escherichia coli; light intensity; photoreactivation; sunlight; temperature; ultraviolet disinfection;
D O I
10.1111/j.1365-2672.2008.03723.x
中图分类号
Q81 [生物工程学(生物技术)]; Q93 [微生物学];
学科分类号
071005 ; 0836 ; 090102 ; 100705 ;
摘要
Aims: To investigate the effects of fluorescent light intensity, sunlight intensity and temperature on photoreactivation of Escherichia coli after low-pressure (LP) and medium-pressure (MP) ultraviolet (UV) disinfection. Methods and Results: Two E. coli strains were irradiated with LP and MP UV lamps, and exposed to various fluorescent light (0-23 kLux) and sunlight intensities (1-80 kLux), and temperatures (4-50 degrees C). Escherichia coli concentrations were enumerated at hourly intervals to determine photoreactivation rates and final photoreactivation levels. Higher photoreactivation rates and levels were observed with increasing fluorescent light intensities, while high sunlight intensity (> 12 kLux) caused a one-log decrease in E. coli concentrations. When exposed to near-optimum growth temperatures (23-37 degrees C), photoreactivation levels were higher than those with too high (50 degrees C) or too low (4 degrees C) temperatures. Overall, photoreactivation following MP UV disinfection was lower than that following LP UV disinfection. Conclusions: Photoreactivation of bacteria following UV disinfection can be a problem in tropical countries where sunlight is abundant and temperatures are high, unless high sunlight intensity is present or if MP UV disinfection is employed. Significance and Impact of the Study: With the increased use of UV disinfection, it is imperative that photoreactivation be taken into account in the design of reactors based on site-specific conditions of temperature and light intensity exposure.
引用
收藏
页码:124 / 133
页数:10
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