Electronic and structural properties of silicon-doped carbon nanotubes

被引:111
作者
Baierle, RJ [1 ]
Fagan, SB
Mota, R
da Silva, AJR
Fazzio, A
机构
[1] Ctr Univ Franciscano, Dept Ciencias Exatas, BR-97010032 Santa Maria, RS, Brazil
[2] Univ Fed Santa Maria, Dept Fis, BR-97105900 Santa Maria, RS, Brazil
[3] Univ Sao Paulo, Inst Fis, BR-05315970 Sao Paulo, Brazil
来源
PHYSICAL REVIEW B | 2001年 / 64卷 / 08期
关键词
D O I
10.1103/PhysRevB.64.085413
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Predictions of the electronic and structural properties of silicon substitutional doping in carbon nanotubes are presented using first-principles calculations based on the density-functional theory. A large outward displacement of the Si atom and its nearest-neighbor carbon atoms is observed. For the two tubes studied [metallic (6,6) and semiconducting ( 10,0)] the formation energies of the substitutional defects are obtained around 3.1 eV/atom. In the doped metallic nanotube case a resonant state appears about 0.7 eV above the Fermi level, whereas for the semiconductor tube, the silicon introduces an empty level at approximately 0.6 eV above the top of the valence band.
引用
收藏
页码:854131 / 854134
页数:4
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