Electrochemical synthesis of polypyrrole within PMMA nanochannels produced by AFM mechanical lithography

被引:16
作者
Chen, JM [1 ]
Liao, SW [1 ]
Tsai, YC [1 ]
机构
[1] Natl Chung Hsing Univ, Dept Chem Engn, Taichung 402, Taiwan
关键词
conducting polymers; polypyrrole; nanowires; electropolymerization; AFM lithography;
D O I
10.1016/j.synthmet.2005.05.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A novel approach for the fabrication of polypyrrole nanowires via electropolymerization within poly(methyl methacrylate) (PMMA) nanochannels on an indium tin oxide (ITO) substrate is reported. The nanochannels width and depth obtained by atomic force microscopy (AFM) mechanical lithography on PMMA coated ITO substrate are about 150 and 35 nm. The nanochannels act as templates for electropolymerization of polypyrrole nanowires. The morphology of PMMA nanochannels and polypyrrole nanowires were investigated by AFM. The polypyrrole nanowires are around 350 nm in width and 20 mu m in length. The conducting properties of polypyrrole nanowires were identified by AFM with a conducting tip (CT-AFM). The AFM current image shows that the current difference can be distinguished between doped polypyrrole nanowires and PMMA thin film. The present methodology demonstrates the feasibility and effectiveness of electropolymerization of polypyrrole nanowires within PMMA nanochannels produced by AFM mechanical lithography. (C) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:11 / 17
页数:7
相关论文
共 55 条
  • [11] Room-temperature repositioning of individual C-60 molecules at Cu steps: Operation of a molecular counting device
    Cuberes, MT
    Schlittler, RR
    Gimzewski, JK
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (20) : 3016 - 3018
  • [12] Exploiting the properties of carbon nanotubes for nanolithography
    Dai, HJ
    Franklin, N
    Han, J
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (11) : 1508 - 1510
  • [13] Stability of n-type doped conducting polymers and consequences for polymeric microelectronic devices
    deLeeuw, DM
    Simenon, MMJ
    Brown, AR
    Einerhand, REF
    [J]. SYNTHETIC METALS, 1997, 87 (01) : 53 - 59
  • [14] Characterization of scanning tunneling microscopy and atomic force microscopy-based techniques for nanolithography on hydrogen-passivated silicon
    Fontaine, PA
    Dubois, E
    Stievenard, D
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 84 (04) : 1776 - 1781
  • [15] A conducting polymer nanojunction sensor for glucose detection
    Forzani, ES
    Zhang, HQ
    Nagahara, LA
    Amlani, I
    Tsui, R
    Tao, NJ
    [J]. NANO LETTERS, 2004, 4 (09) : 1785 - 1788
  • [16] Multiple ink nanolithography: Toward a multiple-pen nano-plotter
    Hong, SH
    Zhu, J
    Mirkin, CA
    [J]. SCIENCE, 1999, 286 (5439) : 523 - 525
  • [17] Fabrication of metallic nanostructures by atomic force microscopy nanomachining and lift-off process
    Hsu, JH
    Lin, CY
    Lin, HN
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 2768 - 2771
  • [18] Fabrication of silicon and metal nanowires and dots using mechanical atomic force lithography
    Hu, S
    Hamidi, A
    Altmeyer, S
    Koster, T
    Spangenberg, B
    Kurz, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (05): : 2822 - 2824
  • [19] Novel approach to atomic force lithography
    Hu, S
    Altmeyer, S
    Hamidi, A
    Spangenberg, B
    Kurz, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (04): : 1983 - 1986
  • [20] Jahromi S, 2002, CHEMPHYSCHEM, V3, P693, DOI 10.1002/1439-7641(20020816)3:8<693::AID-CPHC693>3.0.CO