Electrochemical synthesis of polypyrrole within PMMA nanochannels produced by AFM mechanical lithography

被引:16
作者
Chen, JM [1 ]
Liao, SW [1 ]
Tsai, YC [1 ]
机构
[1] Natl Chung Hsing Univ, Dept Chem Engn, Taichung 402, Taiwan
关键词
conducting polymers; polypyrrole; nanowires; electropolymerization; AFM lithography;
D O I
10.1016/j.synthmet.2005.05.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A novel approach for the fabrication of polypyrrole nanowires via electropolymerization within poly(methyl methacrylate) (PMMA) nanochannels on an indium tin oxide (ITO) substrate is reported. The nanochannels width and depth obtained by atomic force microscopy (AFM) mechanical lithography on PMMA coated ITO substrate are about 150 and 35 nm. The nanochannels act as templates for electropolymerization of polypyrrole nanowires. The morphology of PMMA nanochannels and polypyrrole nanowires were investigated by AFM. The polypyrrole nanowires are around 350 nm in width and 20 mu m in length. The conducting properties of polypyrrole nanowires were identified by AFM with a conducting tip (CT-AFM). The AFM current image shows that the current difference can be distinguished between doped polypyrrole nanowires and PMMA thin film. The present methodology demonstrates the feasibility and effectiveness of electropolymerization of polypyrrole nanowires within PMMA nanochannels produced by AFM mechanical lithography. (C) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:11 / 17
页数:7
相关论文
共 55 条
  • [1] IDENTIFICATION OF THE 1ST STEPS OF THE ELECTROCHEMICAL POLYMERIZATION OF PYRROLES BY MEANS OF FAST POTENTIAL STEP TECHNIQUES
    ANDRIEUX, CP
    AUDEBERT, P
    HAPIOT, P
    SAVEANT, JM
    [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1991, 95 (24) : 10158 - 10164
  • [2] THE ELECTRODEPOSITION OF POLYPYRROLE FILMS FROM AQUEOUS-SOLUTIONS
    ASAVAPIRIYANONT, S
    CHANDLER, GK
    GUNAWARDENA, GA
    PLETCHER, D
    [J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1984, 177 (1-2): : 229 - 244
  • [3] Nanoparticle manipulation by mechanical pushing: underlying phenomena and real-time monitoring
    Baur, C
    Bugacov, A
    Koel, BE
    Madhukar, A
    Montoya, N
    Ramachandran, TR
    Requicha, AAG
    Resch, R
    Will, P
    [J]. NANOTECHNOLOGY, 1998, 9 (04) : 360 - 364
  • [4] Beh WS, 1999, ADV MATER, V11, P1038, DOI 10.1002/(SICI)1521-4095(199908)11:12<1038::AID-ADMA1038>3.0.CO
  • [5] 2-L
  • [6] MANIPULATION OF C-60 MOLECULES ON A SI SURFACE
    BETON, PH
    DUNN, AW
    MORIARTY, P
    [J]. APPLIED PHYSICS LETTERS, 1995, 67 (08) : 1075 - 1077
  • [7] ATOMIC FORCE MICROSCOPE
    BINNIG, G
    QUATE, CF
    GERBER, C
    [J]. PHYSICAL REVIEW LETTERS, 1986, 56 (09) : 930 - 933
  • [8] SURFACE STUDIES BY SCANNING TUNNELING MICROSCOPY
    BINNING, G
    ROHRER, H
    GERBER, C
    WEIBEL, E
    [J]. PHYSICAL REVIEW LETTERS, 1982, 49 (01) : 57 - 61
  • [9] Lift-off lithography using an atomic force microscope
    Bouchiat, V
    Esteve, D
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (20) : 3098 - 3100
  • [10] FABRICATION OF NANOMETER-SCALE SIDE-GATED SILICON FIELD-EFFECT TRANSISTORS WITH AN ATOMIC-FORCE MICROSCOPE
    CAMPBELL, PM
    SNOW, ES
    MCMARR, PJ
    [J]. APPLIED PHYSICS LETTERS, 1995, 66 (11) : 1388 - 1390